Tantalum electrodeposition using a nanoporous anodic alumina template and a nanostructured gold/nickel-chromium glass-ceramic substrate
dc.contributor.author | Šimůnková, Helena | cs |
dc.contributor.author | Kolíbalová, Eva | cs |
dc.contributor.author | Kalina, Lukáš | cs |
dc.contributor.author | Lednický, Tomáš | cs |
dc.contributor.author | Bábor, Petr | cs |
dc.contributor.author | Hubálek, Jaromír | cs |
dc.coverage.issue | 1 | cs |
dc.coverage.volume | 239 | cs |
dc.date.accessioned | 2025-08-06T11:00:11Z | |
dc.date.available | 2025-08-06T11:00:11Z | |
dc.date.issued | 2025-05-21 | cs |
dc.description.abstract | The electrodeposition and analysis of tantalum (Ta) nanotube arrays prepared from an ionic liquid, 1-butyl-1methylpyrrolidinium bis(trifluoro-methylsulfonyl) imide (BMP[Tf2N]), using a porous anodic alumina (PAA) template are newly presented. Free-standing and spatially separated tantalum nanotube arrays were achieved after selective etching of the PAA. The high-rate electrodeposition of the nanotube arrays took only 10 s and achieved approximately 70 atomic percent Ta metal. Superficial X-ray photoelectron spectroscopy supplemented by an argon ion etching and depth profiling has proven the presence of tantalum metal. Additionally, tantalum electrodeposition was attempted using a sputter-deposited gold coating on a planar glass-ceramic substrate as the working electrode. Pores emerged within the sputter-deposited gold layer as a side result of the Ta electrodeposition step. Nano-to submicrometer large pores were created due to a foreign element penetration into the gold and etching effect of fluorides contained in the ionic liquid solution. | en |
dc.description.embargo | 2027-05-21 | cs |
dc.format | text | cs |
dc.format.extent | 1-8 | cs |
dc.format.mimetype | application/pdf | cs |
dc.identifier.citation | Vacuum. 2025, vol. 239, issue 1, p. 1-8. | en |
dc.identifier.doi | 10.1016/j.vacuum.2025.114438 | cs |
dc.identifier.issn | 0042-207X | cs |
dc.identifier.orcid | 0000-0003-1800-4686 | cs |
dc.identifier.orcid | 0000-0002-8548-8185 | cs |
dc.identifier.orcid | 0000-0001-8127-8175 | cs |
dc.identifier.orcid | 0000-0003-0564-1862 | cs |
dc.identifier.orcid | 0000-0002-4948-1883 | cs |
dc.identifier.orcid | 0000-0002-7496-2558 | cs |
dc.identifier.other | 198167 | cs |
dc.identifier.researcherid | D-7753-2012 | cs |
dc.identifier.scopus | 25926769300 | cs |
dc.identifier.scopus | 55255338000 | cs |
dc.identifier.scopus | 57207501711 | cs |
dc.identifier.uri | https://hdl.handle.net/11012/255394 | |
dc.language.iso | en | cs |
dc.publisher | PERGAMON-ELSEVIER SCIENCE LTD | cs |
dc.relation.ispartof | Vacuum | cs |
dc.relation.uri | https://www.sciencedirect.com/science/article/pii/S0042207X25004282 | cs |
dc.rights | Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International | cs |
dc.rights.access | embargoedAccess | cs |
dc.rights.sherpa | http://www.sherpa.ac.uk/romeo/issn/0042-207X/ | cs |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/4.0/ | cs |
dc.subject | Tantalum electrodeposition | en |
dc.subject | Vacuum annealing | en |
dc.subject | Nanostructured tantalum | en |
dc.subject | Nanoporous gold | en |
dc.subject | Scanning transmission electron microscopy | en |
dc.title | Tantalum electrodeposition using a nanoporous anodic alumina template and a nanostructured gold/nickel-chromium glass-ceramic substrate | en |
dc.type.driver | article | en |
dc.type.status | Peer-reviewed | en |
dc.type.version | acceptedVersion | en |
sync.item.dbid | VAV-198167 | en |
sync.item.dbtype | VAV | en |
sync.item.insts | 2025.08.06 13:00:11 | en |
sync.item.modts | 2025.08.06 12:33:59 | en |
thesis.grantor | Vysoké učení technické v Brně. Fakulta elektrotechniky a komunikačních technologií. Ústav mikroelektroniky | cs |
thesis.grantor | Vysoké učení technické v Brně. Fakulta chemická. Ústav chemie materiálů | cs |
thesis.grantor | Vysoké učení technické v Brně. Středoevropský technologický institut VUT. Chytré nanonástroje | cs |
thesis.grantor | Vysoké učení technické v Brně. Středoevropský technologický institut VUT. Sdílená laboratoř RP1 | cs |