Cleaning of tungsten tips for subsequent use as cold field emitters or STM probes

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dc.contributor.authorKošelová, Zuzanacs
dc.contributor.authorHoráková, Lenkacs
dc.contributor.authorBurda, Danielcs
dc.contributor.authorAllaham, Mohammad Mahmoudcs
dc.contributor.authorKnápek, Alexandrcs
dc.contributor.authorFohlerová, Zdenkacs
dc.coverage.issue1cs
dc.coverage.volume75cs
dc.date.accessioned2024-05-13T08:45:50Z
dc.date.available2024-05-13T08:45:50Z
dc.date.issued2024-01-31cs
dc.description.abstractThis study investigates the crucial process of cleaning cold field emission electron emitters and scanning tunnel microscopy (STM) probes, particularly focusing on tungsten tips. The cleanliness of these tips is essential for maintaining optimal cathode properties, preventing impurities that can significantly affect the emission process. Various cleaning methods, including macroetching, ammonia cleaning, and hydrofluoric acid (HF) cleaning were explored and compared by scanning electron microscopy. The macroetching method, involving a mixture of hydrochloric acid, nitric acid, and hydrogen fluoride, proved to be too reactive, causing significant material removal and altering the tip's structure. Ammonia cleaning did not significantly improve or harm the samples. However, oxide islands appeared in some areas, suggesting the potential formation of ammonium tungsten oxide. HF cleaning, specifically at 20% and 50% concentrations, demonstrated effectiveness in removing tungsten oxides without damaging the tip. Pre-cleaning with water and ethanol proved beneficial for subsequent HF refinement. Results suggest that HF is the most suitable method for oxide removal but a rinse with water is essential for removing residual sodium hydroxide. To maintain optimal properties, it is crucial to apply a less reactive layer quickly or transfer the tips to a water/ethanol bath to prevent oxidation.en
dc.formattextcs
dc.format.extent41-46cs
dc.format.mimetypeapplication/pdfcs
dc.identifier.citationJournal of Electrical Engineering. 2024, vol. 75, issue 1, p. 41-46.en
dc.identifier.doi10.2478/jee-2024-0006cs
dc.identifier.issn1339-309Xcs
dc.identifier.orcid0000-0002-1084-9935cs
dc.identifier.orcid0000-0002-4931-0419cs
dc.identifier.orcid0000-0003-0752-8214cs
dc.identifier.orcid0000-0002-1232-2301cs
dc.identifier.other187804cs
dc.identifier.researcheridABE-7009-2021cs
dc.identifier.researcheridE-6640-2013cs
dc.identifier.researcheridA-6893-2013cs
dc.identifier.scopus57216492743cs
dc.identifier.scopus36544102200cs
dc.identifier.urihttps://hdl.handle.net/11012/245487
dc.language.isoencs
dc.publisherFEI STUcs
dc.relation.ispartofJournal of Electrical Engineeringcs
dc.relation.urihttp://iris.elf.stuba.sk/JEEEC/data/pdf/1_124-06.pdfcs
dc.rightsCreative Commons Attribution-NonCommercial-NoDerivatives 4.0 Internationalcs
dc.rights.accessopenAccesscs
dc.rights.sherpahttp://www.sherpa.ac.uk/romeo/issn/1339-309X/cs
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/cs
dc.subjectSTM probesen
dc.subjectfield emissionen
dc.subjectcleaning procedureen
dc.subjecttungsten tipen
dc.subjectFEMen
dc.titleCleaning of tungsten tips for subsequent use as cold field emitters or STM probesen
dc.type.driverarticleen
dc.type.statusPeer-revieweden
dc.type.versionpublishedVersionen
sync.item.dbidVAV-187804en
sync.item.dbtypeVAVen
sync.item.insts2024.05.13 10:45:49en
sync.item.modts2024.05.13 10:14:13en
thesis.grantorVysoké učení technické v Brně. Fakulta elektrotechniky a komunikačních technologií. Ústav mikroelektronikycs
thesis.grantorVysoké učení technické v Brně. Fakulta chemická. Ústav chemie materiálůcs
thesis.grantorVysoké učení technické v Brně. Fakulta elektrotechniky a komunikačních technologií. Ústav fyzikycs
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