Electrical and optical study of transparent V-based oxide semiconductors prepared by magnetron sputtering under different conditions
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Date
2011-04
Authors
Prociow, Eugeniusz
Zielinski, Maciej
Sieradzka, Karolina
Domaradzki, Jaroslaw
Kaczmarek, Danuta
ORCID
Advisor
Referee
Mark
Journal Title
Journal ISSN
Volume Title
Publisher
Společnost pro radioelektronické inženýrství
Abstract
This work is focused on structural, optical and electrical behaviors of vanadium-based oxide thin films prepared by magnetron sputtering under different conditions. Thin films have been deposited on glass substrates from metallic vanadium target at low sputtering pressure. Different working gases: argon/oxygen mixture, and especially pure oxygen gas, have been applied. Results of X-ray diffraction together with optical transmission and temperature- dependent electrical resistivity measurements have been presented. Transmission coefficient, cut-off wavelength and the width of the optical band gap have been calculated from optical measurements. The d.c. resistivity values at room temperature and thermal activation energy have been obtained from electrical investigations. The influence of sputtering process conditions on optical and electrical properties has been discussed.
Description
Citation
Radioengineering. 2011, vol. 20, č. 1, s. 204-208. ISSN 1210-2512
http://www.radioeng.cz/fulltexts/2011/11_01_204_208.pdf
http://www.radioeng.cz/fulltexts/2011/11_01_204_208.pdf
Document type
Peer-reviewed
Document version
Published version
Date of access to the full text
Language of document
en