Reactive Magnetron Sputtering of the Aluminium Oxide Coating

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but.event.date28.04.2016cs
but.event.titleStudent EEICT 2016cs
dc.contributor.authorDušek, Jan
dc.date.accessioned2018-07-10T12:48:15Z
dc.date.available2018-07-10T12:48:15Z
dc.date.issued2016cs
dc.description.abstractThis contribution deals with design, check and test of deposition parameters for new installed aluminium target. In addition of individual parts of deposition process and hysteresis of sputtering thin films of Al2O3 was verified. This made it possible to determine borders of reactive and metallic mode. The designed borders were created technological window for sputtering Al2O3 films. The sputtered thin films are tested on mechanical, optical properties and adhesion.en
dc.formattextcs
dc.format.extent231-233cs
dc.format.mimetypeapplication/pdfen
dc.identifier.citationProceedings of the 22nd Conference STUDENT EEICT 2016. s. 231-233. ISBN 978-80-214-5350-0cs
dc.identifier.isbn978-80-214-5350-0
dc.identifier.urihttp://hdl.handle.net/11012/83926
dc.language.isocscs
dc.publisherVysoké učení technické v Brně, Fakulta elektrotechniky a komunikačních technologiícs
dc.relation.ispartofProceedings of the 22nd Conference STUDENT EEICT 2016en
dc.relation.urihttp://www.feec.vutbr.cz/EEICT/cs
dc.rights© Vysoké učení technické v Brně, Fakulta elektrotechniky a komunikačních technologiícs
dc.rights.accessopenAccessen
dc.subjectReactive magnetron sputteringen
dc.subjectpulse sputteringen
dc.subjectaluminium oxide coatingen
dc.titleReactive Magnetron Sputtering of the Aluminium Oxide Coatingen
dc.type.driverconferenceObjecten
dc.type.statusPeer-revieweden
dc.type.versionpublishedVersionen
eprints.affiliatedInstitution.departmentFakulta elektrotechniky a komunikačních technologiícs
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