Reactive Magnetron Sputtering of the Aluminium Oxide Coating
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Date
Authors
Dušek, Jan
Advisor
Referee
Mark
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Vysoké učení technické v Brně, Fakulta elektrotechniky a komunikačních technologií
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Abstract
This contribution deals with design, check and test of deposition parameters for new installed aluminium target. In addition of individual parts of deposition process and hysteresis of sputtering thin films of Al2O3 was verified. This made it possible to determine borders of reactive and metallic mode. The designed borders were created technological window for sputtering Al2O3 films. The sputtered thin films are tested on mechanical, optical properties and adhesion.
Description
Citation
Proceedings of the 22nd Conference STUDENT EEICT 2016. s. 231-233. ISBN 978-80-214-5350-0
http://www.feec.vutbr.cz/EEICT/
http://www.feec.vutbr.cz/EEICT/
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Peer-reviewed
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Published version
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cs