Field Ion Microscopy of Tungsten Nano-Tips Coated with Thin Layer of the EpoxyResin

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dc.contributor.authorSobola, Dinaracs
dc.contributor.authorAL Soud, Ammarcs
dc.contributor.authorKnápek, Alexandrcs
dc.contributor.authorMousa, Marwancs
dc.contributor.authorSchubert, Richardcs
dc.contributor.authorKočková, Pavlacs
dc.contributor.authorŠkarvada, Pavelcs
dc.date.accessioned2024-08-22T08:02:29Z
dc.date.available2024-08-22T08:02:29Z
dc.date.issued2024-07-30cs
dc.description.abstractThis paper reports results of analysis of field ion emission mechanism from tungstenepoxy composite emitters that are compared to tungsten nanofield emitters. In this context, the mechanism of emission from this type of emitters is described based on a theory of induced conductive channels. The tungsten emitters were prepared using the electrochemical polishing technique and coated with a layer of the epoxy resin. Field ion microscope (FIM) analyses are reported including the study of the emissionion density distributions from both the uncoated and coated emitters. Two forms of emission patterns have been observed in the ion emission microscopy technique describing the differences in the emission mechanism of both types of emitters. The observed results show: (a) the expected crystalline surface atomic distribution images of the field ion microscopy in the case of uncoated tungsten tips, and (b) randomly distributed emission spots that describe the locations of the induced conductive channels inside the resin coating layer.en
dc.formattextcs
dc.format.extent1-11cs
dc.format.mimetypeapplication/pdfcs
dc.identifier.doi10.20944/preprints202407.2357.v1cs
dc.identifier.orcid0000-0002-0008-5265cs
dc.identifier.orcid0000-0003-0752-8214cs
dc.identifier.orcid0000-0002-8059-7761cs
dc.identifier.other189279cs
dc.identifier.researcheridG-1175-2019cs
dc.identifier.researcheridE-6640-2013cs
dc.identifier.scopus57189064262cs
dc.identifier.scopus36544102200cs
dc.identifier.urihttps://hdl.handle.net/11012/249382
dc.language.isoencs
dc.publisherPreprints.orgcs
dc.relation.uri10.20944/preprints202407.2357.v1cs
dc.rightsCreative Commons Attribution 4.0 Internationalcs
dc.rights.accessopenAccesscs
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/cs
dc.subjectfield ion emissionen
dc.subjecttungsten atomic distributionen
dc.subjectepoxy molecular distributionen
dc.subjectcomposite field emitteren
dc.subjectcomposite electron sourcesen
dc.titleField Ion Microscopy of Tungsten Nano-Tips Coated with Thin Layer of the EpoxyResinen
dc.type.driverotheren
dc.type.versionsubmittedVersionen
sync.item.dbidVAV-189279en
sync.item.dbtypeVAVen
sync.item.insts2024.08.22 10:02:29en
sync.item.modts2024.08.20 14:33:49en
thesis.grantorVysoké učení technické v Brně. Fakulta elektrotechniky a komunikačních technologií. Ústav mikroelektronikycs
thesis.grantorVysoké učení technické v Brně. Středoevropský technologický institut VUT. Pokročilé keramické materiálycs
thesis.grantorVysoké učení technické v Brně. Fakulta elektrotechniky a komunikačních technologií. Ústav fyzikycs
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