Polymerization mechanisms of hexamethyldisiloxane in low-pressure plasmas involving complex geometries

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dc.contributor.authorNavascues, Paulacs
dc.contributor.authorJanůšová, Martinacs
dc.contributor.authorZajíčková, Lenkacs
dc.contributor.authorRupper, Patrickcs
dc.contributor.authorHegemann, Dirkcs
dc.coverage.issue158824cs
dc.coverage.volume645cs
dc.date.accessioned2025-06-19T09:56:20Z
dc.date.available2025-06-19T09:56:20Z
dc.date.issued2024-02-01cs
dc.description.abstractHexamethyldisiloxane (HMDSO) low-pressure plasmas are known for their versatility in the deposition of plasma polymer films (PPFs) with different properties and applications. Although they have been studied for decades, the reaction mechanisms of plasma polymer formation leave open questions, particularly when deposition on 3D materials with complex geometries such as cavities and undercuts is considered. In the present study, two configurations named "cavity" and "undercut" have been selected to study the influence of diffusion of film forming species and surface reactivity in HMDSO plasmas without and with O2 admixture. A varying spatial chemical composition of the plasma polymer deposit along the penetration depth of the studied configurations indicates different sticking probabilities of the film-forming species. Furthermore, although ion-induced effects are usually only considered for direct plasma exposure, the obtained results and additional etching experiments reveal that the contribution of high-energy particles might still be considered underneath small openings. Finally, the relevance of oxidizing chemical reactions at the surface inside the configurations is clarified when O2 is added to the plasma.en
dc.formattextcs
dc.format.extent9cs
dc.format.mimetypeapplication/pdfcs
dc.identifier.citationAPPLIED SURFACE SCIENCE. 2024, vol. 645, issue 158824, 9 p.en
dc.identifier.doi10.1016/j.apsusc.2023.158824cs
dc.identifier.issn1873-5584cs
dc.identifier.orcid0000-0002-6906-8906cs
dc.identifier.other196712cs
dc.identifier.researcheridE-3010-2012cs
dc.identifier.urihttps://hdl.handle.net/11012/254273
dc.language.isoencs
dc.publisherELSEVIERcs
dc.relation.ispartofAPPLIED SURFACE SCIENCEcs
dc.relation.urihttps://www.sciencedirect.com/science/article/pii/S0169433223025047cs
dc.rightsCreative Commons Attribution 4.0 Internationalcs
dc.rights.accessopenAccesscs
dc.rights.sherpahttp://www.sherpa.ac.uk/romeo/issn/1873-5584/cs
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/cs
dc.subjectPlasma polymerizationen
dc.subjectHMDSOen
dc.subjectATR-FTIRen
dc.subjectSurface oxidationen
dc.titlePolymerization mechanisms of hexamethyldisiloxane in low-pressure plasmas involving complex geometriesen
dc.type.driverarticleen
dc.type.statusPeer-revieweden
dc.type.versionpublishedVersionen
sync.item.dbidVAV-196712en
sync.item.dbtypeVAVen
sync.item.insts2025.06.19 11:56:20en
sync.item.modts2025.06.19 11:33:11en
thesis.grantorVysoké učení technické v Brně. Fakulta elektrotechniky a komunikačních technologií. Ústav teoretické a experimentální elektrotechnikycs
thesis.grantorVysoké učení technické v Brně. Středoevropský technologický institut VUT. Plazmové technologie pro materiálycs
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