Porous-anodic-alumina-templated Ta-Nb-alloy oxide coatings via the magnetron-sputtering anodizing as novel 3D nanostructured electrodes for energy-storage applications

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dc.contributor.authorMozalev, Alexandercs
dc.contributor.authorBendová, Máriacs
dc.contributor.authorGispert-Guirado, Francesccs
dc.contributor.authorLlobet, Eduardcs
dc.contributor.authorHabazaki, Hirokics
dc.coverage.issue1cs
dc.coverage.volume489cs
dc.date.accessioned2024-12-10T13:55:28Z
dc.date.available2024-12-10T13:55:28Z
dc.date.issued2024-06-26cs
dc.description.abstractThe Ta-Nb thin alloy films were magnetron sputter-deposited over a low-aspect-ratio nanoporous anodic-alumina template formed in 0.05 M tartaric acid solution at 250 V and modified by the pore-widening technique to enlarge the pores up to 500 nm. The alloy coated the pores evenly, thus forming a 3D continuous conducting nanofilm on the template. Partially anodizing the templated alloy in a borate buffer solution of pH 7.5 generated a compact amorphous mixed-oxide anodic film thickening proportionally to the applied voltage. An unusual two-layered structure with a sharp electrical interface revealed in the 3D oxide films anodized to 30–130 V, comprising a low-resistivity layer superimposed on the high-resistivity layer, is explained by an immobile negative space charge in the outer film part. The air-annealing at moderate temperatures releases the space charge and transforms the two layers into a high-resistivity single layer having substantially improved dielectric properties and thermostable (up to 250 deg) capacitance of 1.2 F cm2 achieved for the film anodized to practical 50 V. The 3D films having up to 4.5 times enlarged effective surface area can be utilized as novel metal/oxide nanostructured electrodes for electrolytic microcapacitors suitable for classical electronic circuits and energy-storage applications.en
dc.formattextcs
dc.format.extent1-14cs
dc.format.mimetypeapplication/pdfcs
dc.identifier.citationSURFACE & COATINGS TECHNOLOGY. 2024, vol. 489, issue 1, p. 1-14.en
dc.identifier.doi10.1016/j.surfcoat.2024.131042cs
dc.identifier.issn1879-3347cs
dc.identifier.orcid0000-0002-9505-5359cs
dc.identifier.other189816cs
dc.identifier.researcheridH-3928-2012cs
dc.identifier.scopus6601972151cs
dc.identifier.urihttps://hdl.handle.net/11012/249744
dc.language.isoencs
dc.publisherElseviercs
dc.relation.ispartofSURFACE & COATINGS TECHNOLOGYcs
dc.relation.urihttps://www.sciencedirect.com/science/article/pii/S025789722400673Xcs
dc.rightsCreative Commons Attribution 4.0 Internationalcs
dc.rights.accessopenAccesscs
dc.rights.sherpahttp://www.sherpa.ac.uk/romeo/issn/1879-3347/cs
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/cs
dc.subjectporous anodic aluminaen
dc.subjecttantalum-niobium alloyen
dc.subjectanodic oxide filmsen
dc.subject3D nanostructuresen
dc.subjectelectrolytic capacitoren
dc.titlePorous-anodic-alumina-templated Ta-Nb-alloy oxide coatings via the magnetron-sputtering anodizing as novel 3D nanostructured electrodes for energy-storage applicationsen
dc.type.driverarticleen
dc.type.statusPeer-revieweden
dc.type.versionpublishedVersionen
sync.item.dbidVAV-189816en
sync.item.dbtypeVAVen
sync.item.insts2024.12.10 14:55:28en
sync.item.modts2024.10.15 13:32:08en
thesis.grantorVysoké učení technické v Brně. Středoevropský technologický institut VUT. Sdílená laboratoř RP1cs
thesis.grantorVysoké učení technické v Brně. Fakulta elektrotechniky a komunikačních technologií. Ústav mikroelektronikycs
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