Structural and Optical Properties of Luminescent Copper(I) Chloride Thin Films Deposited by Sequentially Pulsed Chemical Vapour Deposition

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dc.contributor.authorKrumpolec, Richardcs
dc.contributor.authorHomola, Tomášcs
dc.contributor.authorCameron, David Campbellcs
dc.contributor.authorHumlíček, Josefcs
dc.contributor.authorCaha, Ondřejcs
dc.contributor.authorKuldová, Karlacs
dc.contributor.authorZazpe Mendioroz, Raúlcs
dc.contributor.authorPřikryl, Jancs
dc.contributor.authorMacák, Jancs
dc.coverage.issue10cs
dc.coverage.volume8cs
dc.date.issued2018-10-01cs
dc.description.abstractSequentially pulsed chemical vapour deposition was used to successfully deposit thin nanocrystalline films of copper(I) chloride using an atomic layer deposition system in order to investigate their application to UV optoelectronics. The films were deposited at 125 degrees C using [Bis(trimethylsilyl)acetylene](hexafluoroacetylacetonato)copper(I) as a Cu precursor and pyridine hydrochloride as a new Cl precursor. The films were analysed by XRD, X-ray photoelectron spectroscopy (XPS), SEM, photoluminescence, and spectroscopic reflectance. Capping layers of aluminium oxide were deposited in situ by ALD (atomic layer deposition) to avoid environmental degradation. The film adopted a polycrystalline zinc blende-structure. The main contaminants were found to be organic materials from the precursor. Photoluminescence showed the characteristic free and bound exciton emissions from CuCl and the characteristic exciton absorption peaks could also be detected by reflectance measurements.en
dc.formattextcs
dc.format.extent1-16cs
dc.format.mimetypeapplication/pdfcs
dc.identifier.citationCoatings, MDPI. 2018, vol. 8, issue 10, p. 1-16.en
dc.identifier.doi10.3390/coatings8100369cs
dc.identifier.issn2079-6412cs
dc.identifier.orcid0000-0001-7091-3022cs
dc.identifier.other150687cs
dc.identifier.scopus55655855500cs
dc.identifier.urihttp://hdl.handle.net/11012/195621
dc.language.isoencs
dc.publisherMDPIcs
dc.relation.ispartofCoatings, MDPIcs
dc.relation.urihttp://www.mdpi.com/2079-6412/8/10/369cs
dc.rightsCreative Commons Attribution 4.0 Internationalcs
dc.rights.accessopenAccesscs
dc.rights.sherpahttp://www.sherpa.ac.uk/romeo/issn/2079-6412/cs
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/cs
dc.subjectvapour depositionen
dc.subjectcopper chlorideen
dc.subjectcharacterizationen
dc.subjectoptical propertiesen
dc.subjectXPSen
dc.subjectcrystal structureen
dc.titleStructural and Optical Properties of Luminescent Copper(I) Chloride Thin Films Deposited by Sequentially Pulsed Chemical Vapour Depositionen
dc.type.driverarticleen
dc.type.statusPeer-revieweden
dc.type.versionpublishedVersionen
sync.item.dbidVAV-150687en
sync.item.dbtypeVAVen
sync.item.insts2025.02.03 15:51:16en
sync.item.modts2025.01.17 18:32:37en
thesis.grantorVysoké učení technické v Brně. Středoevropský technologický institut VUT. Pokročilé nízkodimenzionální nanomateriálycs
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Pokročilé nízkodimenzionální nanomateriály