Lithographic thin–film structures based on Electrochromic materials: Case study by scanning probe microscopy

Abstract

The main object of this study will be based on producing and characterization of lithographic thin–film structures produced based electrochromic materials. Atomic force microscopy will be used as a main method of evaluation the morphology of lithographic structures. The optical properties of eslectrochromic materials will be analyze using scanning near–field optical microscopy by applying different electrical potential.