Chemical Vapour Deposition of Gas Sensitive Metal Oxides

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dc.contributor.authorVallejos Vargas, Stellacs
dc.contributor.authorDi Maggio, Francescocs
dc.contributor.authorShujah, Tahiracs
dc.contributor.authorBlackman, Chriscs
dc.coverage.issue1cs
dc.coverage.volume4cs
dc.date.accessioned2021-12-08T11:54:27Z
dc.date.available2021-12-08T11:54:27Z
dc.date.issued2016-01-01cs
dc.description.abstractThis article presents a review of recent research efforts and developments for the fabrication of metal-oxide gas sensors using chemical vapour deposition (CVD), presenting its potential advantages as a materials synthesis technique for gas sensors along with a discussion of their sensing performance. Thin films typically have poorer gas sensing performance compared to traditional screen printed equivalents, attributed to reduced porosity, but the ability to integrate materials directly with the sensor platform provides important process benefits compared to competing synthetic techniques. We conclude that these advantages are likely to drive increased interest in the use of CVD for gas sensor materials over the next decade, whilst the ability to manipulate deposition conditions to alter microstructure can help mitigate the potentially reduced performance in thin films, hence the current prospects for use of CVD in this field look excellent.en
dc.formattextcs
dc.format.extent1-18cs
dc.format.mimetypeapplication/pdfcs
dc.identifier.citationChemosensors. 2016, vol. 4, issue 1, p. 1-18.en
dc.identifier.doi10.3390/chemosensors4010004cs
dc.identifier.issn2227-9040cs
dc.identifier.other170140cs
dc.identifier.urihttp://hdl.handle.net/11012/203113
dc.language.isoencs
dc.publisherMDPIcs
dc.relation.ispartofChemosensorscs
dc.relation.urihttps://www.mdpi.com/2227-9040/4/1/4cs
dc.rightsCreative Commons Attribution 4.0 Internationalcs
dc.rights.accessopenAccesscs
dc.rights.sherpahttp://www.sherpa.ac.uk/romeo/issn/2227-9040/cs
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/cs
dc.subjectcatalysten
dc.subjectCVDen
dc.subjectnanoparticleen
dc.subjectmetal oxideen
dc.subjectsensoren
dc.subjectnanoen
dc.subjectchemical vapor depositionen
dc.subjectkatalyzátor
dc.subjectCVD
dc.subjectnanočástice
dc.titleChemical Vapour Deposition of Gas Sensitive Metal Oxidesen
dc.type.driverarticleen
dc.type.statusPeer-revieweden
dc.type.versionpublishedVersionen
sync.item.dbidVAV-170140en
sync.item.dbtypeVAVen
sync.item.insts2021.12.08 12:54:27en
sync.item.modts2021.12.08 12:14:25en
thesis.grantorVysoké učení technické v Brně. Fakulta elektrotechniky a komunikačních technologií. Ústav mikroelektronikycs
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