Kurz přípravy MEMS – mikro elektro mechanických součástek
| dc.contributor.author | Eliáš, Marek | |
| dc.date.accessioned | 2024-05-03T11:03:33Z | |
| dc.date.available | 2024-05-03T11:03:33Z | |
| dc.date.created | 2023-11-30 | cs |
| dc.date.issued | 2024-05-03 | cs |
| dc.description.abstract | This course aims to provide an overview of the basic theoretical knowledge in dry etching, which is used to create Micro-Electro-Mechanical Systems (MEMS ). You will learn about the principles of etching, basic terminology, types of plasmas used for etching, differences between dry and wet etching, etc. | en |
| dc.format | text | cs |
| dc.format.mimetype | application/pdf | cs |
| dc.identifier.uri | https://hdl.handle.net/11012/245341 | |
| dc.language.iso | cs | cs |
| dc.publisher | VUT v Brně | cs |
| dc.relation.projectId | NPO_VUT_MSMT-16609/2022 | |
| dc.relation.uri | https://www.vut.cz/vav/projekty/npo | cs |
| dc.rights | Creative Commons Attribution-ShareAlike 4.0 International | cs |
| dc.rights.access | openAccess | cs |
| dc.rights.uri | http://creativecommons.org/licenses/by-sa/4.0/ | cs |
| dc.subject | Dry etching | cs |
| dc.subject | wet etching | cs |
| dc.subject | MEMS | cs |
| dc.subject | reactiv ion etching (RIE) | cs |
| dc.subject | deep silicon etching (DSE) | cs |
| dc.title | Kurz přípravy MEMS – mikro elektro mechanických součástek | cs |
| dc.type.driver | other | en |
| dc.type.version | publishedVersion | en |
Files
Original bundle
1 - 1 of 1
