Elevating Platinum to Volumetric Capacitance: High Surface Area Electrodes through Reactive Pt Sputtering
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Date
2024-05-17
Authors
Gryszel, Maciej
Jakešová, Marie
Vu, Xuan Thang
Ingebrandt, Sven
Glowacki, Eric Daniel
ORCID
0000-0002-0280-8017Advisor
Referee
Mark
Journal Title
Journal ISSN
Volume Title
Publisher
WILEY
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Abstract
Platinum is the most widespread electrode material used for implantable biomedical and neuroelectronic devices, motivating exploring ways to improve its performance and understand its fundamental properties. Using reactive magnetron sputtering, PtOx is prepared, which upon partial reduction yields a porous thin-film form of platinum with favorable properties, notably record-low impedance values outcompeting other reports for platinum-based electrodes. It is established that its high electrochemical capacitance scales with thickness, in the way of volumetric capacitor materials like IrOx and poly(3,4-ethylenedioxythiophene), PEDOT. Unlike these two well-known analogs, however, it is found that PtOx capacitance is not caused by reversible pseudofaradaic reactions but rather due to high surface area. In contrast to IrOx, PtOx is not a reversible valence-change oxide, but rather a porous form of platinum. The findings show that this oxygen-containing form of Pt can place Pt electrodes on a level competitive with IrOx and PEDOT. Due to its relatively low cost and ease of preparation, PtOx can be a good choice for microfabricated bioelectronic devices. Platinum is used in many medical implants, but lags behind next-generation electrode materials in performance. How sputtered platinum oxide is a microfabricatable thin film material that provides bioelectronics electrodes with volumetric capacitance and low impedance that tweaks platinum to compete at the level of conducting polymers and IrOx is shown. image
Description
Citation
Journal of Interconnection Networks. 2024, vol. 13, issue 5, 7 p.
https://onlinelibrary.wiley.com/doi/10.1002/adhm.202302400
https://onlinelibrary.wiley.com/doi/10.1002/adhm.202302400
Document type
Peer-reviewed
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Published version
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Language of document
en