Depth profiling of thin plasma-polymerized amine films using GDOES in an Ar-O-2 plasma

Simple item page
dc.contributor.authorKovač, Janezcs
dc.contributor.authorEkar, Jernejcs
dc.contributor.authorČekada, Mihacs
dc.contributor.authorZajíčková, Lenkacs
dc.contributor.authorNečas, Davidcs
dc.contributor.authorJanů, Luciecs
dc.contributor.authorWang, Jiang Yongcs
dc.contributor.authorMozetič, Mirancs
dc.coverage.issue1cs
dc.coverage.volume581cs
dc.date.accessioned2023-03-10T07:52:41Z
dc.date.available2023-03-10T07:52:41Z
dc.date.issued2022-04-15cs
dc.description.abstractThin polymer films were deposited on polished stainless-steel samples by PECVD from a cyclopropylamine precursor and characterized by X-ray photoelectron spectroscopy, secondary-ion mass spectrometry and glow discharge optical emission spectroscopy (GDOES) depth profiling. These depth profiles exhibited reasonable agreement. The GDOES involved the erosion of the polymer films in plasma sustained by an asymmetric RF capacitively coupled discharge using both Ar and Ar-O-2 gases. The application of pure Ar caused unwanted effects, such as the broadening of the polymer-film/substrate interface, which were suppressed when using the mixture with oxygen. Another benefit of oxygen was a significant increase in the etching rate by a factor of about 15 as compared to pure argon. The mechanisms involved in the depth profiling using the mixture of gases were elaborated in some detail, taking into account plasma parameters typical for an asymmetric, capacitively coupled RF discharge in a small volume. The main benefit of using the Ar/O-2 GDOES profiling with respect to XPS and SIMS depth profiling is the increased sputtering rate for polymer films. Comparing the GDOES depth profiling with the Ar/O-2 mixture with profiling in pure Ar, the benefits are a higher sputtering rate and better depth resolution at the polymer/substrate interface.en
dc.formattextcs
dc.format.extent1-10cs
dc.format.mimetypeapplication/pdfcs
dc.identifier.citationAPPLIED SURFACE SCIENCE. 2022, vol. 581, issue 1, p. 1-10.en
dc.identifier.doi10.1016/j.apsusc.2021.152292cs
dc.identifier.issn1873-5584cs
dc.identifier.other179263cs
dc.identifier.urihttp://hdl.handle.net/11012/209187
dc.language.isoencs
dc.publisherELSEVIERcs
dc.relation.ispartofAPPLIED SURFACE SCIENCEcs
dc.relation.urihttps://www.sciencedirect.com/science/article/pii/S0169433221033171?via%3Dihubcs
dc.rightsCreative Commons Attribution-NonCommercial-NoDerivatives 4.0 Internationalcs
dc.rights.accessopenAccesscs
dc.rights.sherpahttp://www.sherpa.ac.uk/romeo/issn/1873-5584/cs
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/cs
dc.subjectGDOESen
dc.subjectDepth profileen
dc.subjectAmine plasma polymeren
dc.subjectAr-O-2 plasmaen
dc.titleDepth profiling of thin plasma-polymerized amine films using GDOES in an Ar-O-2 plasmaen
dc.type.driverarticleen
dc.type.statusPeer-revieweden
dc.type.versionpublishedVersionen
sync.item.dbidVAV-179263en
sync.item.dbtypeVAVen
sync.item.insts2023.03.10 08:52:41en
sync.item.modts2023.03.10 08:14:23en
thesis.grantorVysoké učení technické v Brně. Středoevropský technologický institut VUT. Plazmové technologie pro materiálycs
Files
Original bundle
Now showing 1 - 1 of 1
Thumbnail Image
Name:
1s2.0S0169433221033171main.pdf
Size:
2.21 MB
Format:
Adobe Portable Document Format
Description:
1s2.0S0169433221033171main.pdf
Download
Collections
Plazmové technologie pro materiály