Surface morphology and X-ray photoelectron spectroscopy of BiFeO3 thin films deposited on top of Ta2O5/Si layers

Abstract

In this study a comparison of the topography of BiFeO3 (BFO) thin films deposited on tantalum pentoxide substrates of different thicknesses is provided. The Ta2O5 substrates had a roughness increasing with the film thickness. The relationship between substrates of different topography but the same composition with the quality of the growing bismuth ferrite film is estimated. For the first time the topography estimation of BFO on Ta2O5 is presented. The difference in temperature expansion coefficients leads to intensive evaporation of bismuth ferrite from the surface during annealing. XPS analysis is provided for asdeposited and annealed BFO layers.In this study a comparison of the topography of BiFeO3 (BFO) thin films deposited on tantalum pentoxide substrates of different thicknesses is provided. The Ta2O5 substrates had a roughness increasing with the film thickness. The relationship between substrates of different topography but the same composition with the quality of the growing bismuth ferrite film is estimated. For the first time the topography estimation of BFO on Ta2O5 is presented. The difference in temperature expansion coefficients leads to intensive evaporation of bismuth ferrite from the surface during annealing. XPS analysis is provided for asdeposited and annealed BFO layers.