Kurz elektronové litografie – příprava nanostruktur
| dc.contributor.author | Radim Hrdý, Vojtěch Švarc | cs |
| dc.date.accessioned | 2024-01-10T08:53:22Z | |
| dc.date.available | 2024-01-10T08:53:22Z | |
| dc.date.created | 2023-06-30 | cs |
| dc.date.issued | 2023-10-25 | cs |
| dc.description.abstract | This course teaches how to handle lithographic chemicals. It lists positive and negative resists for EBL and DWL, and recommends developers, solvents, and removers/strippers. You will learn how to develop a resist, and what glassware and fumehood you should use. | cs |
| dc.format | text | cs |
| dc.format.mimetype | application/pdf | cs |
| dc.identifier.uri | https://hdl.handle.net/11012/244226 | |
| dc.language.iso | cs | cs |
| dc.publisher | VUT v Brně | cs |
| dc.relation.projectId | NPO_VUT_MSMT-16609/2022 | |
| dc.relation.uri | https://www.vut.cz/vav/projekty/npo | cs |
| dc.rights | Creative Commons Attribution-ShareAlike 4.0 International | cs |
| dc.rights.access | openAccess | cs |
| dc.rights.uri | http://creativecommons.org/licenses/by-sa/4.0/ | cs |
| dc.subject | Chemicals, EBL, DWL, Positive resist, Negative resist | en |
| dc.title | Kurz elektronové litografie – příprava nanostruktur | cs |
| dc.type.driver | other | en |
| dc.type.version | publishedVersion | en |
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