Kurz elektronové litografie – příprava nanostruktur
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Date
2023-10-25
Authors
Radim Hrdý, Vojtěch Švarc
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VUT v Brně
Abstract
This course teaches how to handle lithographic chemicals. It lists positive and negative resists for EBL and DWL, and recommends developers, solvents, and removers/strippers. You will learn how to develop a resist, and what glassware and fumehood you should use.
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cs
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Creative Commons Attribution-ShareAlike 4.0 International
http://creativecommons.org/licenses/by-sa/4.0/
http://creativecommons.org/licenses/by-sa/4.0/