Kurz elektronové litografie – příprava nanostruktur

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Radim Hrdý, Vojtěch Švarc

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Mark

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VUT v Brně

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Abstract

This course teaches how to handle lithographic chemicals. It lists positive and negative resists for EBL and DWL, and recommends developers, solvents, and removers/strippers. You will learn how to develop a resist, and what glassware and fumehood you should use.

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cs

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Except where otherwised noted, this item's license is described as Creative Commons Attribution-ShareAlike 4.0 International
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