Functional nano-structuring of thin silicon nitride membranes

Simple item page
dc.contributor.authorMatějka, Milancs
dc.contributor.authorKrátký, Stanislavcs
dc.contributor.authorŘíháček, Tomášcs
dc.contributor.authorKnápek, Alexandrcs
dc.contributor.authorKolařík, Vladimírcs
dc.coverage.issue2cs
dc.coverage.volume71cs
dc.date.issued2020-05-13cs
dc.description.abstractThe paper describes the development and production of a nano-optical device consisting of a nano-perforated layer of silicon nitride stretched in a single-crystal silicon frame using electron beam lithography (EBL) and reactive ion etching (RIE) techniques. Procedures for transferring nanostructures to the nitride layer are described, starting with the preparation of a metallic mask layer by physical vapor deposition (PVD), high-resolution pattern recording technique using EBL and the transfer of the motif into the functional layer using the RIE technique. Theoretical aspects are summarized including technological issues, achieved results and application potential of patterned silicon nitride membranes.en
dc.formattextcs
dc.format.extent127-130cs
dc.format.mimetypeapplication/pdfcs
dc.identifier.citationJournal of Electrical Engineering . 2020, vol. 71, issue 2, p. 127-130.en
dc.identifier.doi10.2478/jee-2020-0019cs
dc.identifier.issn1335-3632cs
dc.identifier.orcid0000-0003-0752-8214cs
dc.identifier.other165291cs
dc.identifier.researcheridE-6640-2013cs
dc.identifier.scopus36544102200cs
dc.identifier.urihttp://hdl.handle.net/11012/196581
dc.language.isoencs
dc.publisherSciendocs
dc.relation.ispartofJournal of Electrical Engineeringcs
dc.relation.urihttps://www.sciendo.com/article/10.2478/jee-2020-0019cs
dc.rightsCreative Commons Attribution-NonCommercial-NoDerivatives 4.0 Internationalcs
dc.rights.accessopenAccesscs
dc.rights.sherpahttp://www.sherpa.ac.uk/romeo/issn/1335-3632/cs
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/cs
dc.subjectmembraneen
dc.subjectnano optical deviceen
dc.subjectelectron opticsen
dc.subjectelectron beam lithographyen
dc.subjectsilicon nitrideen
dc.subjectreactive ion etchingen
dc.subjectsilicon etchingen
dc.subjectmicrofabricationen
dc.titleFunctional nano-structuring of thin silicon nitride membranesen
dc.type.driverarticleen
dc.type.statusPeer-revieweden
dc.type.versionpublishedVersionen
sync.item.dbidVAV-165291en
sync.item.dbtypeVAVen
sync.item.insts2025.02.03 15:41:01en
sync.item.modts2025.01.17 15:33:53en
thesis.grantorVysoké učení technické v Brně. Fakulta elektrotechniky a komunikačních technologií. Ústav mikroelektronikycs
thesis.grantorVysoké učení technické v Brně. . Ústav přístrojové techniky AV ČRcs
Files
Original bundle
Now showing 1 - 1 of 1
Thumbnail Image
Name:
10.2478_jee20200019.pdf
Size:
568.38 KB
Format:
Adobe Portable Document Format
Description:
10.2478_jee20200019.pdf
Download
Collections
Ústav mikroelektroniky