Influence of Deposition Parameters on the Plasmonic Properties of Gold Nanoantennas Fabricated by Focused Ion Beam Lithography

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dc.contributor.authorFoltýn, Michaelcs
dc.contributor.authorPatočka, Marekcs
dc.contributor.authorŘepa, Rostislavcs
dc.contributor.authorŠikola, Tomášcs
dc.contributor.authorHorák, Michalcs
dc.coverage.issue35cs
dc.coverage.volume9cs
dc.date.accessioned2024-10-14T09:03:56Z
dc.date.available2024-10-14T09:03:56Z
dc.date.issued2024-08-20cs
dc.description.abstractThe behavior of plasmonic antennas is influenced by a variety of factors, including their size, shape, and material. Even minor changes in the deposition parameters during the thin film preparation process may have a significant impact on the dielectric function of the film, and thus on the plasmonic properties of the resulting antenna. In this work, we deposited gold thin films with thicknesses of 20, 30, and 40 nm at various deposition rates using an ion-beam-assisted deposition. We evaluate their morphology and crystallography by atomic force microscopy, X-ray diffraction, and transmission electron microscopy. Next, we examined the ease of fabricating plasmonic antennas using focused-ion-beam lithography. Finally, we evaluate their plasmonic properties by electron energy loss spectroscopy measurements of individual antennas. Our results show that the optimal gold thin film for plasmonic antenna fabrication of a thickness of 20 and 30 nm should be deposited at the deposition rate of around 0.1 nm/s. The thicker 40 nm film should be deposited at a higher deposition rate like 0.3 nm/s.en
dc.formattextcs
dc.format.extent37408-37416cs
dc.format.mimetypeapplication/pdfcs
dc.identifier.citationACS OMEGA. 2024, vol. 9, issue 35, p. 37408-37416.en
dc.identifier.doi10.1021/acsomega.4c06598cs
dc.identifier.issn2470-1343cs
dc.identifier.orcid0009-0009-7886-964Xcs
dc.identifier.orcid0000-0003-4217-2276cs
dc.identifier.orcid0000-0001-6503-8294cs
dc.identifier.other189679cs
dc.identifier.researcheridR-2546-2017cs
dc.identifier.scopus57200608539cs
dc.identifier.urihttps://hdl.handle.net/11012/249514
dc.language.isoencs
dc.publisherAMER CHEMICAL SOCcs
dc.relation.ispartofACS OMEGAcs
dc.relation.urihttps://pubs.acs.org/doi/10.1021/acsomega.4c06598cs
dc.rightsCreative Commons Attribution 4.0 Internationalcs
dc.rights.accessopenAccesscs
dc.rights.sherpahttp://www.sherpa.ac.uk/romeo/issn/2470-1343/cs
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/cs
dc.subjectAntennasen
dc.subjectDepositionen
dc.subjectGrainen
dc.subjectPlasmonicsen
dc.subjectThin Filmsen
dc.titleInfluence of Deposition Parameters on the Plasmonic Properties of Gold Nanoantennas Fabricated by Focused Ion Beam Lithographyen
dc.type.driverarticleen
dc.type.statusPeer-revieweden
dc.type.versionpublishedVersionen
eprints.grantNumberinfo:eu-repo/grantAgreement/MSM/EH/EH22_008/0004572cs
sync.item.dbidVAV-189679en
sync.item.dbtypeVAVen
sync.item.insts2024.10.14 11:03:56en
sync.item.modts2024.10.02 12:32:01en
thesis.grantorVysoké učení technické v Brně. Fakulta strojního inženýrství. Ústav fyzikálního inženýrstvícs
thesis.grantorVysoké učení technické v Brně. Středoevropský technologický institut VUT. Příprava a charakterizace nanostrukturcs
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Ústav fyzikálního inženýrství
Příprava a charakterizace nanostruktur