Influence of Deposition Parameters on the Plasmonic Properties of Gold Nanoantennas Fabricated by Focused Ion Beam Lithography
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Date
2024-08-20
Authors
Foltýn, Michael
Patočka, Marek
Řepa, Rostislav
Šikola, Tomáš
Horák, Michal
0009-0009-7886-964XAdvisor
Referee
Mark
Journal Title
Journal ISSN
Volume Title
Publisher
AMER CHEMICAL SOC
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Abstract
The behavior of plasmonic antennas is influenced by a variety of factors, including their size, shape, and material. Even minor changes in the deposition parameters during the thin film preparation process may have a significant impact on the dielectric function of the film, and thus on the plasmonic properties of the resulting antenna. In this work, we deposited gold thin films with thicknesses of 20, 30, and 40 nm at various deposition rates using an ion-beam-assisted deposition. We evaluate their morphology and crystallography by atomic force microscopy, X-ray diffraction, and transmission electron microscopy. Next, we examined the ease of fabricating plasmonic antennas using focused-ion-beam lithography. Finally, we evaluate their plasmonic properties by electron energy loss spectroscopy measurements of individual antennas. Our results show that the optimal gold thin film for plasmonic antenna fabrication of a thickness of 20 and 30 nm should be deposited at the deposition rate of around 0.1 nm/s. The thicker 40 nm film should be deposited at a higher deposition rate like 0.3 nm/s.
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Citation
ACS OMEGA. 2024, vol. 9, issue 35, p. 37408-37416.
https://pubs.acs.org/doi/10.1021/acsomega.4c06598
https://pubs.acs.org/doi/10.1021/acsomega.4c06598
Document type
Peer-reviewed
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Published version
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Language of document
en