Kurz optické litografie – základní příprava mikrostruktur
| dc.contributor.author | Urbánek, Michal | cs |
| dc.date.accessioned | 2024-01-10T08:53:21Z | |
| dc.date.available | 2024-01-10T08:53:21Z | |
| dc.date.created | 2023-03-30 | cs |
| dc.date.issued | 2023-10-25 | cs |
| dc.description.abstract | The aim of this course is to give you an overview of all common lithography techniques used in micro- and nanofabrication, their basic principles, advantages and disadvantages, and their main application areas. After finishing this course, you should know the most common terminology used in nanolithography and be able to select the appropriate lithography technique for your application. | cs |
| dc.format | text | cs |
| dc.format.mimetype | application/pdf | cs |
| dc.identifier.uri | https://hdl.handle.net/11012/244222 | |
| dc.language.iso | cs | cs |
| dc.publisher | VUT v Brně | cs |
| dc.relation.projectId | NPO_VUT_MSMT-16609/2022 | |
| dc.relation.uri | https://www.vut.cz/vav/projekty/npo | cs |
| dc.rights | Creative Commons Attribution-ShareAlike 4.0 International | cs |
| dc.rights.access | openAccess | cs |
| dc.rights.uri | http://creativecommons.org/licenses/by-sa/4.0/ | cs |
| dc.subject | Lithography, DWL, EBL | en |
| dc.title | Kurz optické litografie – základní příprava mikrostruktur | cs |
| dc.type.driver | other | en |
| dc.type.version | publishedVersion | en |
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