Characterization Of Aln Nanolayers Deposited On A Surface Of Hopg By Pe-Ald

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but.event.date27.04.2021cs
but.event.titleSTUDENT EEICT 2021cs
dc.contributor.authorDallaev, Rashid
dc.date.accessioned2023-01-06T10:05:44Z
dc.date.available2023-01-06T10:05:44Z
dc.date.issued2021cs
dc.description.abstractIn this study plasma-enhanced atomic layer deposition process of AlN has been performedwith the purpose to test the expediency of highly oriented pyrolytic graphite (HOPG) to serve as asubstrate in such process. The obtained samples were thoroughly analyzed using various analyticaltechniques. Atomic force microscopy was employed for studying topographic and morphologicalfeatures of the surface; x-ray photoelectron spectroscopy (XPS) analysis supported by second ionmassspectrometry method (SIMS) has been conducted on the obtained sample to investigate thechemical nature of the deposited films as well as elemental distribution. Temperature stability ofHOPG makes it a suitable substrate for preparation of AlN films, being a bottom contact for furthertesting of the films electrical properties. The data gathered from the aforementioned techniques haveindicated that HOPG is a viable choice for AlN ALD process.en
dc.formattextcs
dc.format.extent193-198cs
dc.format.mimetypeapplication/pdfen
dc.identifier.citationProceedings II of the 27st Conference STUDENT EEICT 2021: Selected Papers. s. 193-198. ISBN 978-80-214-5943-4cs
dc.identifier.doi10.13164/eeict.2021.193
dc.identifier.isbn978-80-214-5943-4
dc.identifier.urihttp://hdl.handle.net/11012/200839
dc.language.isoencs
dc.publisherVysoké učení technické v Brně, Fakulta elektrotechniky a komunikačních technologiícs
dc.relation.ispartofProceedings II of the 27st Conference STUDENT EEICT 2021: Selected papersen
dc.relation.urihttps://conf.feec.vutbr.cz/eeict/index/pages/view/ke_stazenics
dc.rights© Vysoké učení technické v Brně, Fakulta elektrotechniky a komunikačních technologiícs
dc.rights.accessopenAccessen
dc.subjectaluminium nitrideen
dc.subjectatomic layer depositionen
dc.subjecthighly oriented pyrolytic graphiteen
dc.subjectx-rayphotoelectron spectroscopyen
dc.subjectatomic force microscopyen
dc.subjectsecond ion-mass spectrometryen
dc.titleCharacterization Of Aln Nanolayers Deposited On A Surface Of Hopg By Pe-Alden
dc.type.driverconferenceObjecten
dc.type.statusPeer-revieweden
dc.type.versionpublishedVersionen
eprints.affiliatedInstitution.departmentFakulta elektrotechniky a komunikačních technologiícs
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