Anodic TiO2 nanotube walls reconstructed: Inner wall replaced by ALD TiO2 coating

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dc.contributor.authorMotola, Martincs
dc.contributor.authorZazpe Mendioroz, Raúlcs
dc.contributor.authorHromádko, Luděkcs
dc.contributor.authorPřikryl, Jancs
dc.contributor.authorČičmancová, Veronikacs
dc.contributor.authorRodriguez Pereira, Jhonatancs
dc.contributor.authorSopha, Hanna Ingridcs
dc.contributor.authorMacák, Jancs
dc.coverage.issue1cs
dc.coverage.volume549cs
dc.date.accessioned2021-11-30T11:55:18Z
dc.date.available2021-11-30T11:55:18Z
dc.date.issued2021-05-30cs
dc.description.abstractA reconstruction process of TiO2 nanotube (TNT) layers towards their superior photoelectrochemical performance and photocatalytic activity is presented. At first, TNT layers (similar to 5 mu m thick, similar to 250 nm in diameter) were prepared via electrochemical anodization to obtain double-wall (DW) TNT layers. Second, a selective chemical treatment was conducted to etch the inner wall, yielding single-wall (SW) TNT layers. Third, TNT layers were coated by an additional approx. 5.5 nm, 11 nm, and 16 nm thick TiO2 coatings, respectively, using Atomic Layer Deposition (ALD). A pronounced increase in the incident photon-to-electron conversion efficiency (reaching similar to 85% at lambda - 350 nm) was achieved on SW TNT layers coated with 11 nm thick ALD coatings compared to SW without coating (similar to 35% at lambda = 350 nm). This is due to the optimal thickness of the ALD TiO2 coating that passivates surface states and improves the separation of the photogenerated charge carriers. Photocatalytic performance of SW TNT layers with 11 nm thick ALD coatings (rate constant; k = 0.1156 min(-1)) was increased by approx. 10-times compared to that of the nowadays most reported blank DW TNT layers (rate constant; k = 0.0119 min(-1)).en
dc.formattextcs
dc.format.extent1-8cs
dc.format.mimetypeapplication/pdfcs
dc.identifier.citationAPPLIED SURFACE SCIENCE. 2021, vol. 549, issue 1, p. 1-8.en
dc.identifier.doi10.1016/j.apsusc.2021.149306cs
dc.identifier.issn1873-5584cs
dc.identifier.other172860cs
dc.identifier.urihttp://hdl.handle.net/11012/203009
dc.language.isoencs
dc.publisherElseviercs
dc.relation.ispartofAPPLIED SURFACE SCIENCEcs
dc.relation.urihttps://www.sciencedirect.com/science/article/pii/S0169433221003822cs
dc.rightsCreative Commons Attribution-NonCommercial-NoDerivatives 4.0 Internationalcs
dc.rights.accessopenAccesscs
dc.rights.sherpahttp://www.sherpa.ac.uk/romeo/issn/1873-5584/cs
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/cs
dc.subjectTiO2 nanotube layersen
dc.subjectSingle-wallen
dc.subjectAtomic layer depositionen
dc.subjectPhotoelectrochemistryen
dc.subjectPhotocatalysisen
dc.titleAnodic TiO2 nanotube walls reconstructed: Inner wall replaced by ALD TiO2 coatingen
dc.type.driverarticleen
dc.type.statusPeer-revieweden
dc.type.versionpublishedVersionen
sync.item.dbidVAV-172860en
sync.item.dbtypeVAVen
sync.item.insts2021.12.29 00:54:57en
sync.item.modts2021.12.29 00:16:54en
thesis.grantorVysoké učení technické v Brně. Středoevropský technologický institut VUT. Pokročilé nízkodimenzionální nanomateriálycs
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