Optical Properties of Yttrium Ferrite Films Prepared by Pulse Laser Deposition

Abstract

This study investigates the optical properties of yttrium ferrite thin films fabricated via pulse laser deposition. Yttrium orthoferrite, a ferrimagnetic material known for its potential applications in spintronics and photonics, was deposited on single-crystal substrates under controlled conditions to analyze its optical characteristics. The influence of deposition time on the film quality and optical properties was examined. Atomic force microscopy in contact mode revealed surface roughness variations up to 35 nm, indicating the films' ability to cover substrate defects. Reflectance measurements determined the optical band gap, which decreased from 3.17 eV for thinner films (44 nm) to 2.91 eV for thicker films (93 nm). Forbidden electronic transitions were also observed, attributed to heteroepitaxial growth and phonon interactions. These results demonstrate the effect of film thickness on morphology and optical properties, making YFeO3 films promising for a range of optoelectronic applications.This study investigates the optical properties of yttrium ferrite thin films fabricated via pulse laser deposition. Yttrium orthoferrite, a ferrimagnetic material known for its potential applications in spintronics and photonics, was deposited on single-crystal substrates under controlled conditions to analyze its optical characteristics. The influence of deposition time on the film quality and optical properties was examined. Atomic force microscopy in contact mode revealed surface roughness variations up to 35 nm, indicating the films' ability to cover substrate defects. Reflectance measurements determined the optical band gap, which decreased from 3.17 eV for thinner films (44 nm) to 2.91 eV for thicker films (93 nm). Forbidden electronic transitions were also observed, attributed to heteroepitaxial growth and phonon interactions. These results demonstrate the effect of film thickness on morphology and optical properties, making YFeO3 films promising for a range of optoelectronic applications.