Atmospheric Pressure Microwave Plasma Jet for Organic Thin Film Deposition
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Date
2020-02-06
Authors
Narimisa, Mehrnoush
Krčma, František
Onyshchenko, Yuliia
Kozáková, Zdenka
Morent, Rino
De Geyter, Nathalie
0000-0003-4418-3323Advisor
Referee
Mark
Journal Title
Journal ISSN
Volume Title
Publisher
MDPI
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Abstract
In this work, the potential of a microwave (MW)induced atmospheric pressure plasma jet (APPJ) in film deposition of styrene and methyl methacrylate (MMA) precursors is investigated. Plasma properties during the deposition and resultant coating characteristics are studied. Optical emission spectroscopy (OES) results indicate a higher degree of monomer dissociation in the APPJ with increasing power and a carrier gas flow rate of up to 250 standard cubic centimeters per minute (sccm). Computational fluid dynamic (CFD) simulations demonstrate nonuniform monomer distribution near the substrate and the dependency of the deposition area on the monomercontaining gas flow rate. A nonhomogeneous surface morphology and topography of the deposited coatings is also observed using atomic force microscopy (AFM) and SEM. Coating chemical analysis and wettability are studied by XPS and water contact angle (WCA), respectively. A lower monomer flow rate was found to result in a higher C–O/C–C ratio and a higher wettability of the deposited coatings.
In this work, the potential of a microwave (MW)induced atmospheric pressure plasma jet (APPJ) in film deposition of styrene and methyl methacrylate (MMA) precursors is investigated. Plasma properties during the deposition and resultant coating characteristics are studied. Optical emission spectroscopy (OES) results indicate a higher degree of monomer dissociation in the APPJ with increasing power and a carrier gas flow rate of up to 250 standard cubic centimeters per minute (sccm). Computational fluid dynamic (CFD) simulations demonstrate nonuniform monomer distribution near the substrate and the dependency of the deposition area on the monomercontaining gas flow rate. A nonhomogeneous surface morphology and topography of the deposited coatings is also observed using atomic force microscopy (AFM) and SEM. Coating chemical analysis and wettability are studied by XPS and water contact angle (WCA), respectively. A lower monomer flow rate was found to result in a higher C–O/C–C ratio and a higher wettability of the deposited coatings.
In this work, the potential of a microwave (MW)induced atmospheric pressure plasma jet (APPJ) in film deposition of styrene and methyl methacrylate (MMA) precursors is investigated. Plasma properties during the deposition and resultant coating characteristics are studied. Optical emission spectroscopy (OES) results indicate a higher degree of monomer dissociation in the APPJ with increasing power and a carrier gas flow rate of up to 250 standard cubic centimeters per minute (sccm). Computational fluid dynamic (CFD) simulations demonstrate nonuniform monomer distribution near the substrate and the dependency of the deposition area on the monomercontaining gas flow rate. A nonhomogeneous surface morphology and topography of the deposited coatings is also observed using atomic force microscopy (AFM) and SEM. Coating chemical analysis and wettability are studied by XPS and water contact angle (WCA), respectively. A lower monomer flow rate was found to result in a higher C–O/C–C ratio and a higher wettability of the deposited coatings.
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Keywords
atmospheric pressure plasma jet (APPJ), microwave (MW) discharge, thin film deposition, optical emission spectroscopy (OES), Comsol MultiPhysics, methyl methacrylate (MMA), styrene, atmospheric pressure plasma jet (APPJ), microwave (MW) discharge, thin film deposition, optical emission spectroscopy (OES), Comsol MultiPhysics, methyl methacrylate (MMA), styrene
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Document type
Peer-reviewed
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Language of document
en