SADÍLEK, J. Plazmochemická depozice vrstev z plynné fáze s využitím směsí TVS/Ar a TVS/O2 [online]. Brno: Vysoké učení technické v Brně. Fakulta chemická. 2013.

Posudek vedoucího

Čech, Vladimír

Výsledky předložené v diplomové práci byly získány řešitelským týmem během dvouleté práce na projektu P106/11/0738 (GAČR) zaměřeného na vývoj materiálu s řízenými chemickými a fyzikálními vlastnostmi pro polymerní kompozity. Student se do prací na projektu zapojil v posledním roce studia a výrazným způsobem pomohl řešit technické problémy na technologických a charakterizačních zařízeních. Velice rychle se také zapracoval na práci s vybranými spektroskopickými metodami. Škoda jen, že se mu nepodařilo hlouběji proniknout do studované problematiky tenkých vrstev připravených plazmochemickou technologií z plynné fáze a využít tyto poznatky pro analýzu materiálu, interpretaci výsledků a jejich diskusi. Rovněž měření a zpracování FTIR spekter deponovaných vrstev si zasloužilo více pečlivosti a invence.

Posudek oponenta

Salyk, Ota

Jakub Sadílek Plasma –enhanced chemical vapor deposition using TVS/Ar and TVS/O2 mixtures 1. Meet the requirements of the assignment The diploma thesis is expansive and meets all the requirements. The content is more than 100 pages written in English and corresponds more to Ph. D. thesis. 2. Logic division of the thesis: The thesis has logical division 3. The quality of processing the results: Without objections, it deserves praise. There are fantastic logical trends of all measurement and dependences, good reproducibility, which can be concluded into fabrication of tetravinylsilane plasma-polymer thin films and scientific publications as well. 4. Results and discussion: The extended amount of results is presented. All the results in graphs and tables are very systematically collected and described and the particular trends from graphs are concluded. The conclusions assume that all the reactions resulting in species for thin film building run in space and so a lot of mass spectra of plasma composition were scanned and discussed, but in fact there can run only fragmentation, not the synthesis, so oxidation can run only on solid-gas interface. Presence of SiO species in gas can be as a result of secondary evaporation or sputtering in rf field. All the results can be summarized to several sentences – trends of power effect, trends of oxygen content. Trends of argon dilution and the resulting film are organic plasma polymer at low power and silicon carbide in case of argon dilution and silicon-oxide using oxygen dilution. These developments are well supported by infrared spectra, refractive index and extinction coefficient as well as elemental composition and mechanical properties tests. 5. The literature and references: It contains 117 citations and it is corresponding to the work extent. 6. The language level: English is understandable, but grammatically as well as spelling should be reviewed. But these drawbacks are much compensated by the extent and information value of the thesis. 7. Formal level of the work – the entire impression: The level is high, using graphic program Origin instead more usual Excel, even 3D graphs there occur. The plots in graphs i recommend to distinguish more logically by the system of symbols and colours, not randomly, as separated series of samples can be more easily recognized. Also lot of abbreviations in the introduction and everywhere are not always explained. 8. Conclusions and their formulations: Main results are presented as the optimal settings – power and gas compositions for required thin film properties – optical and mechanical. - Entire evaluation: Excellent / A Questions at defence: 1. What is the mechanism of chemical reactions in diluted gas, in plasma? 2. What is the mechanism of thin film creation from low density plasma?

eVSKP id 58425